Photochemical Etching Equipment · Since 2003 +86 150 1060 8128 etchmachinery@163.com
Home/Etching Machines/Fuel Cell Bipolar Plates

Fuel cell bipolar plate etching machine

Photochemical etching lines for PEMFC and hydrogen-metal BPPs. Stainless steel 316L, titanium TC4, nickel-alloy and aluminium flow-fields — burr-free channels to ±0.02 mm, no heat-affected zone, no tool wear. GE has supplied BPP etching cells to FCEV programmes since 2014.

Metal bipolar plates (BPPs) are the volume bottleneck of every PEM fuel-cell stack — each stack contains 300–500 plates with 0.5–1.5 mm flow-field channels on 0.05–0.30 mm sheet. GE builds the etching machines that produce them. We supply standalone pilot cells for R&D and conveyorised horizontal lines running 1.2–4.0 m/min for series production, configured for your chosen metal, channel pattern and downstream coating line.

Auto photo-etching line for PEMFC bipolar plate production
Why photo etching for BPPs

Photochemical etching vs stamping & laser for BPPs

Stamping still dominates BPP mass production but it has three limits: (1) tool wear shifts land/rib dimensions every 5–10k shots, so fuel-cell performance drifts; (2) the punch leaves a defined burr that has to be polished off later, removing the work-hardened layer; (3) ultra-thin (<0.1 mm) titanium is hard to stamp without wrinkles.

Laser is fast but recasts the cut edge and is slow on serpentine patterns over large areas.

Photochemical etching is the obvious win on three points:

  • Burr-free channels — chemical dissolution leaves a flat, square edge ideal for low ICR coating adhesion.
  • No HAZ — corrosion is at room temperature, so the metal grain stays annealed.
  • Hard-to-stamp metals — titanium TC4, Inconel 625 and 0.05 mm stainless are routine on a horizontal precision etching line.
Recommended machines

GE etching machines for bipolar plate production

Two configurations depending on your volume: pilot, or production line.

Pilot · R&D Precision horizontal etching machine for BPP pilot

Precision Horizontal Etching Machine

  • Etch area650 × 2000 mm
  • Land/rib tolerance±0.02 mm
  • Sheet thickness0.05–1.5 mm
  • EtchantFeCl₃ (SST) / HF-mix (Ti)
  • ModeSpray, batch

Best for FCEV R&D labs and small-series BPP runs.

Production Double-sided spray etching machine for high-volume BPP production

Auto Photo-Etching Line (BPP cell)

  • Etch width650 mm × L
  • Line speed1.2–4.0 m/min
  • Tolerance±0.02 mm land, ±0.005 mm/m waviness
  • ConfigurationPre-treat → Etch → Strip → Wash → Dry
  • Capacity≈600–2400 plates / shift (300×300 mm)

Best for series production of metal BPPs for FCEV passenger stacks.

Process

BPP photochemical etching process

Eight steps from coil to coated half-cell ready for stack assembly.

1

Coil prep

Slit & cut 0.05–0.30 mm 316L / TC4 coil into BPP blanks; alkaline degrease.

2

Laminate

Dry-film photoresist laminated on both sides at 105 °C.

3

Exposure

Double-sided UV exposure of flow-field artwork at ±5 µm alignment.

4

Develop

Spray Na₂CO₃ development — open channels in resist.

5

Etch

Spray FeCl₃ (SST) or HF-mix (Ti) — land etch ±0.02 mm, no burr.

6

Strip

NaOH resist stripping in closed-loop spray module.

7

Wash & dry

Three-stage DI rinse plus hot-air drying.

8

QC

Optical flatness scan, ICR spot-check, leak test before coating.

Cells 1–8 are integrated in a single conveyorised line. Steps 9–10 (passivation, PVD/CVD coating, diffusion bonding) are co-supplied as a turnkey line on request.

GE machine lineup

BPP etching — pick the right machine

Two configurations sit at the heart of every BPP production programme.

GE-JM650-BPP GE-JM650-BPP stainless BPP etching line

GE-JM650-BPP — Stainless BPP Production

316L FeCl₃ etch + regeneration — the workhorse for FCEV bipolar plates.

Power15 kW / 380 V / 50 Hz
Etching width650 / 1220 / 1550 mm
Thickness0.05–1.5 mm (thin land widths common)
Land tolerance±0.02 mm standard
Waviness±0.005 mm/m (TBC w/ inline flatness)
Tank volume800 L PP-lined with regenerable FeCl₃ loop
Throughputapprox. 600–2,400 plates / shift @ 300×300 mm
Line speed1.2–4.0 m/min
CabinetPP high-temp to 100 °C, full exhaust
Module sequencePre-treat → Etch → Strip → Wash → Dry
GE-JM650-T (BPP) GE-JM650-T titanium BPP etching line

GE-JM650-T — Titanium BPP Production

For aerospace-grade stacks: Ti-6Al-4V TC4 plate with HF chemistry.

Etching processAcid-based HF + HNO₃, PFA-lined
Power45 kW / 380 V / 50 Hz
Working width650 mm / height 850 mm
Workpiece thickness0.2–8.0 mm
Land tolerance±0.02 mm (Hi-spec to ±0.005 mm)
Working temp35–55 °C
Conveyor speed0.5–6.0 m/min
SafetyHF leak sensor, Ca-gluconate tank, optional H₂-dehydro
Dimension8000 × 1700 × 1850 mm

Planning a PEMFC BPP etching line?

Tell us your metal, channel geometry and annual volume. We will spec a pilot cell or a 4 m/min turnkey line — and we can quote etchant regeneration plus downstream coating cells.