Pre-treat
Alkaline degrease + water rinse + brush scrubber.
Conveyorised continuous photochemical etching lines — pre-treat, etch, strip, wash, dry — all in one inline turnkey line at 1.5–4.5 m/min. Nameplates, lead frames, EMI shields, PCB panels, BPPs, decors. Built to your alloy, throughput and floor space.
A continuous etching machine is the answer when production volume justifies it. Five inline modules (pre-treat, image-transfer, etch, strip, wash/dry) connected by an overhead or floor conveyor. No manual panel handling between stations — every parameter is software-controlled. The capital cost is recovered on labour and chemistry savings after 18–36 months on most programmes.
Alkaline degrease + water rinse + brush scrubber.
Dry-film laminate or liquid photoresist coater + exposure + developing.
Double-side spray tunnel with chemistry recirculation and regeneration.
Resist strip in NaOH (or alkali) bath + water rinse.
Three-stage DI water rinse + hot-air drying tunnel + exit stacker.
Brush scrub, oxidation micro-etch, spot plating, OSP, inline QC camera.
Workhorse for nameplates, EMI shields, decor panels, BPPs.
For lead frames, EV foils, EMI shields on coil.
A simple formula helps you right-size the line before we quote.
Throughput (m²/24h) ≈ width_m × speed_m/min × active_min.
Throughput (m²/24h) ≈ strip_width_m × speed_m/min × active_min.
Sheet line: ~25 m × 3 m. Reel-to-reel: ~12 m × 2 m.
Two-shift = 16 h × 50 min = 800 min productive / day.
≈ 50 mL/m² at 3 m/min. Closed-loop regen keeps the load low.
Operator hours ≈ 1.5 / shift; preventive maintenance ≈ 4 h / month.
Two continuous archetypes. Same cabinets; the difference is the conveyor.
Conveyorised 5-module turnkey line for sheet etching (nameplates, EMI shields, BPPs, decor).
| Power | 15 kW / 380 V / 50 Hz |
| Sheet width | 650 / 1000 / 1220 / 1550 mm |
| Line speed | 1.5–4.0 m/min |
| Thickness | 0.05–2.0 mm |
| Throughput | approx. 2 k m²/24h @ 650 mm width |
| Modules | Pre-treat → Laminator → Expose → Develop → Etch → Strip → Wash → Dry |
| Etchant | FeCl₃ / CuCl₂ / NaOH (chemistry switch) |
| Dimension | 3850 × 1650 × 1550 mm (etch tank) + 18 m line |
Continuous strip from coil: laminate, expose, develop, etch, strip, wash, plate — inline.
| Strip width | 25–650 mm |
| Strip thickness | 0.05–0.50 mm |
| Line speed | 3.0–4.5 m/min |
| Throughput | approx. 4–6 m²/min @ 200 mm strip |
| Half-etch accuracy | ±0.005 mm |
| Inline modules | Laminate, expose, develop, etch, strip, rinse, plate, dry |
| Optional plating | Matte-Sn / Sn-Pb / Ag spot (inline) |
| Floor footprint | 12 m × 2 m |
Six things to read next — same chemistry, similar tolerances, or the next step in your process.
Single / double-side spray modules →
Conveyorised BPP etch line →
Inline continuous etch + plate for QFN/DFN →
Sheet / coil continuous etch line →
Continuous PCB inner-layer etch →
Inline EV battery shim production →
Tell us your metal, panel/coil width, throughput target and floor constraints. We'll spec a 5-module turnkey line — including regeneration, neutralisation and ROI calculator.