Photochemical Etching Equipment · Since 2003 +86 150 1060 8128 etchmachinery@163.com

Continuous etching machine

Conveyorised continuous photochemical etching lines — pre-treat, etch, strip, wash, dry — all in one inline turnkey line at 1.5–4.5 m/min. Nameplates, lead frames, EMI shields, PCB panels, BPPs, decors. Built to your alloy, throughput and floor space.

A continuous etching machine is the answer when production volume justifies it. Five inline modules (pre-treat, image-transfer, etch, strip, wash/dry) connected by an overhead or floor conveyor. No manual panel handling between stations — every parameter is software-controlled. The capital cost is recovered on labour and chemistry savings after 18–36 months on most programmes.

Inline modules

What's in a continuous line

1

Pre-treat

Alkaline degrease + water rinse + brush scrubber.

2

Image transfer

Dry-film laminate or liquid photoresist coater + exposure + developing.

3

Etch

Double-side spray tunnel with chemistry recirculation and regeneration.

4

Strip

Resist strip in NaOH (or alkali) bath + water rinse.

5

Wash & dry

Three-stage DI water rinse + hot-air drying tunnel + exit stacker.

+

Optional add-ons

Brush scrub, oxidation micro-etch, spot plating, OSP, inline QC camera.

Recommended configuration

GE continuous etching lines

Sheet / panel Auto photo etching line

Auto Photo-Etching / Milling Line (Sheet)

  • Sheet width650 mm × L
  • Line speed1.5–4.0 m/min
  • Thickness0.05–1.5 mm
  • Throughput≈ 2 k m²/24h @ 650 mm wide
  • EtchantFeCl₃ / CuCl₂ / NaOH (switch)

Workhorse for nameplates, EMI shields, decor panels, BPPs.

Strip / coil Reel-to-reel etching machine for strip

Reel-to-Reel Continuous Etching Line

  • Strip width25–650 mm
  • Line speed3.0–4.5 m/min
  • Thickness0.05–0.50 mm
  • Inline modulesLaminate, expose, develop, etch, strip, rinse, dry, plate
  • Throughput≈ 4–6 m²/min

For lead frames, EV foils, EMI shields on coil.

Sizing your line

Throughput math, in a few seconds

A simple formula helps you right-size the line before we quote.

📐 Sheet line

Throughput (m²/24h) ≈ width_m × speed_m/min × active_min.

📐 Reel-to-reel

Throughput (m²/24h) ≈ strip_width_m × speed_m/min × active_min.

📐 Floor space

Sheet line: ~25 m × 3 m. Reel-to-reel: ~12 m × 2 m.

📐 Active minutes

Two-shift = 16 h × 50 min = 800 min productive / day.

📐 Etchant drag-out

≈ 50 mL/m² at 3 m/min. Closed-loop regen keeps the load low.

📐 Maintenance

Operator hours ≈ 1.5 / shift; preventive maintenance ≈ 4 h / month.

GE continuous etching lines

Sheet & reel-to-reel continuous machines

Two continuous archetypes. Same cabinets; the difference is the conveyor.

GE-JM650-W (sheet) GE-JM650-W continuous photo etching line

GE-JM650-W — Sheet / Panel Continuous Line

Conveyorised 5-module turnkey line for sheet etching (nameplates, EMI shields, BPPs, decor).

Power15 kW / 380 V / 50 Hz
Sheet width650 / 1000 / 1220 / 1550 mm
Line speed1.5–4.0 m/min
Thickness0.05–2.0 mm
Throughputapprox. 2 k m²/24h @ 650 mm width
ModulesPre-treat → Laminator → Expose → Develop → Etch → Strip → Wash → Dry
EtchantFeCl₃ / CuCl₂ / NaOH (chemistry switch)
Dimension3850 × 1650 × 1550 mm (etch tank) + 18 m line
GE-RTR650 (reel-to-reel) GE-RTR650 continuous reel-to-reel copper etching line

GE-RTR650 — Reel-to-Reel Continuous

Continuous strip from coil: laminate, expose, develop, etch, strip, wash, plate — inline.

Strip width25–650 mm
Strip thickness0.05–0.50 mm
Line speed3.0–4.5 m/min
Throughputapprox. 4–6 m²/min @ 200 mm strip
Half-etch accuracy±0.005 mm
Inline modulesLaminate, expose, develop, etch, strip, rinse, plate, dry
Optional platingMatte-Sn / Sn-Pb / Ag spot (inline)
Floor footprint12 m × 2 m

Planning a continuous etching line?

Tell us your metal, panel/coil width, throughput target and floor constraints. We'll spec a 5-module turnkey line — including regeneration, neutralisation and ROI calculator.