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Technique information of etching resist
| Name |
ERL-1 photoresist |
| Color |
Blue |
| Viscosity(VT-04E,No.3) |
12-14PS, 60-100S |
| Screen mesh |
100-250mesh |
| Coating thickness |
0.03 to 0.05mm |
| Adhesion |
100/100 |
| Dry |
75±5℃,5-10min |
| UV exposing energy |
100-200mj/cm2, level 7-9 |
| Film hardness after exposure |
2H |
| Resolution |
+/-0.02mm |
| Developing |
3% Sodium carbonate at 30℃,
2kg/cm2 pressure |
| Stripping |
5% Caustic sodium, >50℃, 2-3min |
| Packing |
1kg/can or 5kg/can |
| Shelf life in 10 to 25℃ |
12 Months |
| Mejor features |
Able to resist acid etching solution,
and Cu,Pb/Sn, Ni/Au plating solution |
liquid Photosensitive(photo imageable) etching resist ink used to be photo etching resist(mask). |
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